Background İmpurity |
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Prof. Dr. Sinsi
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Background İmpurity* 1 the concentration of impurity present in a wafer prior to some or all processing Most wafers as manufactured have a uniform concentration of a dopant already in the wafer Alternately the background concentration might be set by a relatively deep diffusion or epitaxial deposition step that another dopant was later introduced into English Related Words* application background * background * background application * background area * background check * background color * background count * background data * background extinction * background fill * background film * background fon * background heating * background information * background irradiance |
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