Background İmpurity
 

* 1.the concentration of impurity present in a wafer prior to some or all processing. Most wafers as manufactured have a uniform concentration of a dopant already in the wafer. Alternately the background concentration might be set by a relatively deep diffusion or epitaxial deposition step that another dopant was later introduced into
English Related Words* application background
* background
* background application
* background area
* background check
* background color
* background count
* background data
* background extinction
* background fill
* background film
* background fon
* background heating
* background information
* background irradiance