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Background İmpurity
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Background İmpurity
07-22-2012
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Prof. Dr. Sinsi
Background İmpurity
* 1
the concentration of impurity present in a wafer prior to some or all processing
Most wafers as manufactured have a uniform concentration of a dopant already in the wafer
Alternately the background concentration might be set by a relatively deep diffusion or epitaxial deposition step that another dopant was later introduced into
English Related Words* application background
* background
* background application
* background area
* background check
* background color
* background count
* background data
* background extinction
* background fill
* background film
* background fon
* background heating
* background information
* background irradiance
Prof. Dr. Sinsi
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